ISBN 9783843922470

978-3-8439-2247-0, Reihe Mikrosystemtechnik

Joel Miron Kropp
Low-Stress LPCVD Silicon Nitride Membranes and Applications for Physical and Biological Sensor Systems

180 Seiten, Dissertation Universität Bremen (2015), Softcover, A5

Zusammenfassung / Abstract

In recent years, the use of MEMs technology has expanded into new areas of applications. One area is chemical industry and applications such as miniature calorimeters. Another area is biology where MEMs technology is used in devices for single cell analysis.

In the manufacturing of MEMs devices, one of the earliest core technology used are silicon nitride (SiN) layers. These layers serve e. g. as passivation layer or as material for membrane and bridge structures. One subtopic of silicon nitride layers are silicon rich SiN layers which are especially useful for the formation of membranes due to their superior mechanical properties.

This work is concerned with the use of silicon rich, low stress silicon nitride layers in chemical, biological and related applications. The first part of this work shows that low stress silicon rich LPCVD silicon nitride has similar or even better chemical stability properties than stoichiometric SiN or PECVD deposited SiN. The second part of the work is concerned with biological compatibility of LPCVD low stress SiN layers. The third part analyzes the use of low stress LPCVD SiN layers as membranes for thermoelectrical flow sensors. The fourth and last part of the work shows the design and fabrication of a combined electroporation and dielectrophoresis MEMs device for single cell analysis.